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publicationDate 2005-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005072491-A
titleOfInvention Dry etching method and method for manufacturing magnetic memory device
abstract PROBLEM TO BE SOLVED: To provide a process capable of satisfactorily etching particularly PtMn used for a pinned layer of MRAM. A dry etching method characterized in that a layer containing platinum and / or manganese is dry etched using pulsed plasma, and a method of manufacturing an MRAM in which this dry etching method is applied to processing of a pinned layer. This MRAM is a memory composed of a magnetic memory element composed of a tunnel magnetoresistive element in which a magnetization fixed layer with a fixed magnetization direction, a tunnel barrier layer, and a magnetic layer capable of changing the magnetization direction are stacked. Part. [Selection] Figure 4
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