| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
2003-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_694db723d5380c13294d67a1e2a7d434
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92ef550662812229f8feb256dce38c2f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f4c53372172e3709a48ae111dd7ce1b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_703d13b81965e9b7ddfb32282582128d |
| publicationDate |
2004-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004341478-A |
| titleOfInvention |
Photosensitive element, method for forming resist pattern using the same, method for manufacturing printed wiring board, and photosensitive resin composition |
| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive film having excellent resolution, capable of reducing a thread-like development residue (insufficient resolution) occurring in a portion where a space between resist patterns is narrow, and forming a resist pattern having a good side shape of the resist pattern. To provide sex elements. SOLUTION: A photosensitive layer comprising a photosensitive resin composition containing (A) a binder polymer, (B) a photopolymerizable compound having an ethylenically unsaturated bond, and (C) a photopolymerization initiator is formed on a resin film. A photosensitive element comprising: (A) a component containing a low molecular weight binder polymer having a weight average molecular weight of 10,000 to 30,000; and the resin film having a haze of 1% or less. Characteristic photosensitive element. [Selection diagram] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11140768-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006184326-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4583916-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006068048-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007003740-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101084470-B |
| priorityDate |
2003-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |