| abstract |
A stripping solution capable of removing copper oxide present on a copper surface without corroding copper metal. SOLUTION: (a) A fluorine compound and (b) an intramolecular compound such as 1-thioglycerol, 3- (2-hydroxyethylthio) -2-hydroxy-propylmercaptan, thiodipropionic acid, and 2-mercaptothiazoline. And (c) a resist stripping solution containing an organic acid or an organic acid salt, and a resist stripping method using the same. The resist stripper of the present invention may contain (d) a basic compound, (e) a water-soluble organic solvent, and (f) water, if desired. [Selection diagram] None |