| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e70c0aeade92d7571d955d3b90ea06e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-26 |
| filingDate |
2003-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f4620d66319cb48f0caab27fb4066aa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a09196b50161483b3a66fdcccdaa2640
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e999b4e3edca3aa9eeefae9d1fefa601
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8b4f8b1e37d7302235588b0199eabfe |
| publicationDate |
2004-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004280049-A |
| titleOfInvention |
Photoresist having hydroxylated and photoacid-cleavable groups |
| abstract |
PROBLEM TO BE SOLVED: To be useful as a base resin of a resist in optical image formation and use of a photoresist (positive type and / or negative type) for image formation in semiconductor device fabrication, and as a base resin for many other uses. To provide novel hydroxyester-containing polymer compositions, and to provide photoresists with improved performance at 193 and 157 nm. As A base resin, wherein: -CO 2 -C (R 1) (R 2) - [C (R 3) (R 4)] n -C (R 5) (R 6) represented by -OH The polymer functionalized with at least one hydroxyester functional group is used to make up the polymer composition and the photoresist. [Selection diagram] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4628809-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004354954-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016210976-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2020129476-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006215067-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7191981-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020129476-A1 |
| priorityDate |
2002-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |