| abstract |
A novel polysiloxane having high transparency at a wavelength of 193 nm or less, excellent dry etching resistance, and particularly excellent environmental resistance, a method for producing the same, and a radiation-sensitive resin composition containing the polysiloxane are provided. The polysiloxane has a structural unit represented by the following formula (I) and a structural unit represented by the following formula (II) and / or (III). Embedded image (In each formula, Y is a divalent hydrocarbon group having a cyclic skeleton or a substituted derivative thereof, R 1 is a monovalent organic group having an acid dissociable group, R 2 is —H, —OH, a halogen atom or an alkoxyl group. Represents a group.) Polysiloxane is characterized in that silane compounds corresponding to the respective structural units are copolycondensed. The radiation-sensitive resin composition contains the polysiloxane and a radiation-sensitive acid generator. [Selection diagram] None |