| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 |
| filingDate |
2002-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_779071ab3d97d002aa01ddd46cfc2089
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c82456dedcd72cbb708c5cf623e11ed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5b7f702146e4af43f9bee790aeb65c5 |
| publicationDate |
2004-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004198446-A |
| titleOfInvention |
Photopolymerizable composition, image forming material using the same, image forming material, and image forming method |
| abstract |
A photopolymerizable composition having high sensitivity and particularly suitable as a dry film resist material and for forming an image directly with a blue-violet laser beam, and an image-forming material and an image-forming material using the same. An image forming method is provided. A photopolymerizable composition containing an ethylenically unsaturated compound (A) component, a sensitizer (B) component, and a photopolymerization initiator (C) component. A photopolymerizable composition wherein the photopolymerization initiator is a hexaarylbiimidazole-based compound having any of the following properties (1), (2) and (3), and an image-forming material and image using the same Forming material and image forming method. (1) The melting point is 180 ° C. or less. (2) A maximum diffraction peak at a Bragg angle (2θ ± 0.2 °) of 21.16 ° in an X-ray diffraction spectrum at a wavelength of 1.54 °. (3) having a solubility of 5% by weight or more in isopropylene glycol monomethyl ether acetate at 20 ° C. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008029765-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007091441-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006035807-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007078894-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007058170-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022202538-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006227221-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021100654-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2006035807-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008050835-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8815472-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4520879-B2 |
| priorityDate |
2002-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |