| abstract |
Disclosed is a composition for a resist stripper which can be rapidly stripped from a photosensitive material such as a photoresist or a dry film resist without leaving a stripped residue on a substrate, and a stripping method using the composition. . An aprotic polar organic solvent is 50 to 98% by weight, an organic amine or an organic quaternary ammonium salt is 0.5 to 10% by weight, and a polyalkylene glycol having an average molecular weight of 800 or more is 0.5 to 20% by weight. %, And a resist stripper containing 1 to 20% by weight of water. [Selection diagram] No selection diagram. |