| abstract |
PROBLEM TO BE SOLVED: To provide a method for firing a cerium compound and cerium oxide particles obtained by the method. Slurry produced from cerium oxide powder is used for polishing silica-based substrates, such as quartz, quartz glass for photomasks, organic films for semiconductor devices, low dielectric constant films, polishing of interlayer insulating films, trench isolation, and glass hard disks. It is useful as an abrasive for final finishing. SOLUTION: This is a method for producing cerium oxide particles by heating a cerium compound from a normal temperature to a temperature range of 400 to 1200 ° C., wherein the temperature is raised at a rate of at least 2 to 60 ° C./hour. A method for producing cerium oxide particles through A manufacturing method, which is a first step of raising the temperature from a room temperature to a temperature range of 200 to 350 ° C., the step including a temperature rising rate of 2 to 60 ° C./hour. This is a manufacturing method in which after the first-stage temperature rise, the second-stage temperature rise of 2 to 200 ° C./hour is performed, and heating is performed to a range of 400 to 1200 ° C. [Selection diagram] None |