http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004101617-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2ed0897e087fa147bc2eb075dbc8b9c1 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F291-00 |
filingDate | 2002-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ca70cfcec8dfd7c17f4cfb5df177513 |
publicationDate | 2004-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2004101617-A |
titleOfInvention | Photosensitive resin composition and laminate thereof |
abstract | A photosensitive material having high resolution, capable of shortening a developing time and a peeling time, and in which a peeling residue hardly occurs in a resist pattern peeling step after electrolytic plating, particularly when applied to a semi-additive method. Provided are a photosensitive resin composition and a photosensitive resin laminate. Kind Code: A1 Abstract: (A) an alkali-soluble polymer, (B) an ethylenically unsaturated addition-polymerizable monomer containing an isocyanurate ring-containing compound represented by the following general formula (I), and (C) a photopolymerization initiator. A photosensitive resin composition is prepared, and a resist pattern is formed using the photosensitive resin composition. Embedded image [Selection diagram] No selection diagram |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013037038-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180019678-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210038554-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105988290-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105988290-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230054276-A |
priorityDate | 2002-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 203.