| abstract |
A film formation method capable of preventing release or permeation of hydrogen and forming a protective film with even better coverage is provided. A film containing an aluminum-containing organic compound having a structural formula of AlH m (R) 3-m (where m = 0, 1, 2, R = CH 3 , C 2 H 5 ), and an oxygen-containing gas. The method includes a step of supplying a gas and a step of forming an alumina film on a substrate by converting a film forming gas into plasma and reacting the film. [Selection diagram] Fig. 1 |