http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003332241-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2002-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a65d59aa48cdeac764baa5c454b69768
publicationDate 2003-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003332241-A
titleOfInvention Microwave plasma processing apparatus, microwave plasma processing method and structure manufacturing method
abstract PROBLEM TO BE SOLVED: To provide a microwave plasma processing apparatus, a microwave processing method, and a method of manufacturing a structure capable of easily causing discharge in a wide range of conditions by limiting reflected power. When a desired power is supplied from a microwave power supply into a plasma processing chamber, a microwave introduced into an endless annular waveguide (118) via a reflection limiting slot (110) is distributed right and left by an E branch (111). Propagated. The distributed microwaves interfere with each other, and an “antinode” of the standing wave 112 is generated every half of the guide wavelength. The dielectric window 1 is inserted through a slot 113 provided so as to cross the surface current. Microwaves are introduced into the plasma processing chamber through the plasma processing chamber 07. Although a part of the microwave incident into the endless annular waveguide 118 returns to the power supply direction as a reflected component, the reflection-restricted slot 110 limits the reflection-side power to less than half of the incident-side power.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017330727-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10553401-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012133441-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006118042-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2006118042-A1
priorityDate 2002-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9627
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID15051
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66198
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6327210
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16682930
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414865795
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419530237
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID413999414
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID160806
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6398
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12573720
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449483415
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414870862
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66185
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456726317
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426098976
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12426
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452872654
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419528482
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457000845
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419518858
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415733498
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16682931
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21881033

Total number of triples: 42.