| abstract |
(57) [Problem] To provide a plasma processing apparatus having high plasma processing capability and capable of performing uniform plasma processing. SOLUTION: Electrodes 2, 3, 4 are provided outside a reaction vessel 1. The space between the electrodes 2, 3, and 4 in the reaction vessel 1 is referred to as a discharge space 5. A gas for plasma generation is supplied to the discharge space 5. A voltage is applied between the electrodes 2, 3, and 4. A discharge is generated in the discharge space 5 at a pressure close to the atmospheric pressure. Plasma P is blown out of discharge space 5. The two electrodes 2 are arranged in a direction substantially parallel to the flow direction of the plasma generating gas in the discharge space 5. 3, two electrodes 2 and 4 are arranged to face each other in a direction substantially perpendicular to the flow direction of the plasma generating gas in the discharge space 5. Electrodes 2, 4 opposed to each other in a direction substantially parallel to the flow direction of the plasma generating gas in discharge space 5, and electrodes 2, 4 opposed to each other in a direction substantially perpendicular to the flow direction of the plasma generation gas in discharge space 5 A power supply 6 for applying a voltage between the two is provided. |