| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate |
2002-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9185a7f10158182370b23c2d481c5254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3d2775e254074423e1a7ec87c2cf6b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6630fc2affe5db658fa8adc42e4fc70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_701e12adef54aad0fcc193c57f5334fd |
| publicationDate |
2003-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003257950-A |
| titleOfInvention |
Method for etching difficult-to-etch material and method and apparatus for manufacturing semiconductor using the same |
| abstract |
(57) [Problem] To improve the etching shape by preventing a deposit generated during etching of an etching material from adhering to a mask. SOLUTION: When etching the film using plasma using a film of a difficult-to-etch material formed on a substrate and a mask formed thereon, an angle of a side wall of the mask with respect to a surface of the substrate is increased. Etching is performed using a mask of less than 90 degrees, whereby the taper angle of the film after etching with respect to the surface of the substrate is equal to or larger than the taper angle of the mask. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200113000-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7163852-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7253044-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7560315-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014236096-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7485579-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110098321-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7172931-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021016042-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007242929-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102462052-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110098321-A |
| priorityDate |
2002-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |