http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003248316-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2002-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1826cb53e8e5226054260a30aabfebb1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_201abdae12f920f7b848ecd29a09137f |
| publicationDate | 2003-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003248316-A |
| titleOfInvention | Positive resist composition |
| abstract | (57) [Summary] (With correction) [PROBLEMS] To provide sufficient transparency when using an exposure light source of 160 nm or less, specifically F 2 excimer laser light (157 nm), and has dependency on line edge roughness and development time. Provided is a small and excellent positive resist composition. SOLUTION: (A) A resin which decomposes by the action of an acid having a structure represented by the following general formula (Y) and increases its solubility in an alkaline developer, (B) Generates an acid upon irradiation with actinic rays or radiation. And a positive resist composition containing (C) a solvent. [In General Formula (Y), R 1 to R 6 may be the same or different and each represents a hydrogen atom, a fluorine atom, an alkyl group, or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom. However, at least one of R 1 to R 6 is a fluorine atom. L represents a hydrogen atom or a group that decomposes by the action of an acid. n represents 1 or 2. If n is 2, 2 R 1 to R 6 and L may be the same or different. A represents a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group, a cyano group or a trifluoromethyl group. ] |
| priorityDate | 2002-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 174.