| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f8cfa5aee4410611b5c562275c9f8e3 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2002-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf6e750f4f582b07af98c29f6e31f898
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2dd87b5d5c1aabdac46dc0ea68902b3 |
| publicationDate |
2003-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003231721-A |
| titleOfInvention |
Photoresist polymers and their production |
| abstract |
PROBLEM TO BE SOLVED: To obtain a polymer for photoresist which can be easily and surely dissolved in a solvent when preparing a resin composition for photoresist. SOLUTION: The polymer for photoresist of the present invention comprises: At least one selected from (A) a repeating unit containing a lactone skeleton, (B) a repeating unit containing a group which is eliminated by an acid to become alkali-soluble, and (C) a repeating unit containing an alicyclic skeleton having a hydroxyl group. A photoresist polymer having various kinds of repeating units, characterized in that when 1 g of a sample is dissolved in 4 g of propylene glycol monomethyl ether acetate with stirring at 25 ° C. for 24 hours, the insoluble content is 1% by weight or less. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101070764-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006193673-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009102659-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007045922-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006176574-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7838606-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006225517-A |
| priorityDate |
2002-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |