| abstract |
(57) Abstract: A radiation-sensitive resin composition having a higher sensitivity to radiation, a higher transparency to visible light, and a transparent film having excellent solvent resistance. I will provide a. [1] A radiation-sensitive resin composition containing a polymer compound (A) having a carboxyl group and an oxetane skeleton, a quinonediazide compound (B), and a polyhydric phenol compound (C). [2] A transparent film formed from the radiation-sensitive resin composition according to [1]. [3] A method for producing a transparent film, wherein a layer comprising the radiation-sensitive resin composition according to [1] is formed on a substrate, and the layer is exposed and developed to form a pattern. |