http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003112964-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4a8faea375370b67c9d71e67db32bcd
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-5409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-5445
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-5436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-786
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-658
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-9607
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-9692
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3224
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3222
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-117
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-117
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
filingDate 2001-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab790af69a5efcade5e942552346464a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07bdef86763158b8ed12fc7456849254
publicationDate 2003-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003112964-A
titleOfInvention Components for semiconductor manufacturing equipment
abstract (57) [Summary] [Problem] To be superior in corrosion resistance to halogen-based corrosive gas, generate less heat due to absorption of high frequency and microwave, and have higher bending strength and hardness than conventional alumina sintered bodies. Provided is a member for a semiconductor manufacturing apparatus comprising an alumina sintered body. The content of yttrium, aluminum, and garnet is 3 to 50% by weight, and the content of silicon oxide is 0.2. % By weight or less, and the balance substantially consists of alumina, A member for a semiconductor manufacturing apparatus is manufactured from an alumina sintered body having a dielectric loss (tan δ) of 10 × 5 −4 GHz or less of 4 × 10 −4 or less.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8278809-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010251281-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101293884-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010109792-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102365798-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4613242-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008247672-A
priorityDate 2001-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16217673
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23993
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458437476
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449789534
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9989226
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451818717
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268

Total number of triples: 49.