| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32623
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3266 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate |
2001-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91c3947314ae32f0b183ab200f886aac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaefb1f3e3c9527f839186c0284d280d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_089ccce2f2eda796b03f4b6767190c9d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f5831425024dbe84d07da7f95304ed0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee59d3e442677676733d3ed3b6f24c72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e652dba5726e95eef7de353bff48ebfe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce1c3812d1d0776f0774f1c83d6608cf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69a039f4b3eafc6f9ae115b6c1b26b3a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec00dd5ecb31e1a216cede71d389cc7b |
| publicationDate |
2003-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003086580-A |
| titleOfInvention |
Magnetic generator in semiconductor manufacturing apparatus, semiconductor manufacturing apparatus, and magnetic field strength control method |
| abstract |
(57) Abstract: Provided are a magnetic generator, a semiconductor manufacturing apparatus, and a magnetic field strength control method in a semiconductor manufacturing apparatus capable of forming an optimum magnetic field intensity distribution. SOLUTION: A magnetic generator 6 for generating magnetism to promote the formation of plasma is arranged around a reaction vessel 2 of the etching apparatus. The magnetic generator 6 includes four main electromagnetic coils 7 for forming a magnetic field substantially parallel to the upper surface of the support in the reaction vessel 2, and are arranged on substantially the same axis as each of the main electromagnetic coils 7. 4 for forming a magnetic field in a direction opposite to the magnetic field formed by the main electromagnetic coil unit 7. And two auxiliary electromagnetic coil portions 8. The auxiliary electromagnetic coil section 8 has a smaller height than the main electromagnetic coil section 7 and is arranged at a position closer to the reaction vessel 2 than the main electromagnetic coil section 7. In the magnetism generating device 6, when a current in a direction opposite to that of the main electromagnetic coil unit 7 is applied to the auxiliary electromagnetic coil unit 8, magnetic fields having polarities opposite to each other are superimposed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8035057-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8593778-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7921804-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8747609-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9589771-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007220501-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120100815-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7976672-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010043357-A |
| priorityDate |
2001-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |