http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003048751-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B3-00 |
| filingDate | 2001-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7012daf4cea52f8a3923821862f44d35 |
| publicationDate | 2003-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003048751-A |
| titleOfInvention | Etching method, method for manufacturing optical element, and optical element |
| abstract | (57) [Problem] To provide an etching method, an optical element manufacturing method, and an optical element capable of smoothing the surface of an optical element. SOLUTION: Since a step-like shape formed on a resist film 6 is smoothed by isotropic etching and transferred to a quartz glass substrate 5 by anisotropic etching, only the anisotropic etching is used. It is possible to manufacture a lens having a smoother and more accurate shape as compared with. The choice between anisotropic etching and isotropic etching is determined by ICP -Since the presence or absence of the bias voltage applied to the electrode 8 of the RIE device 1 is determined, the selection between anisotropic etching and isotropic etching can be made extremely easy, and the surface formation of the lens can be speeded up. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4576412-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009063777-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022185557-A1 |
| priorityDate | 2001-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.