| abstract |
(57) [Abstract] [PROBLEMS] To expand a region in which the removal amount of a photosensitive material can be changed. SOLUTION: In a first stage of exposure, exposure is performed with an amount of light smaller than the amount of exposure at the time of design by an amount of light for removing a CEL layer (A). If the development is performed at this stage, the resist 12 is removed only from the surface side to the portion indicated by the line 14. In the second and subsequent stages of exposure, the amount of light that has been less exposed in the first stage is additionally exposed (B). As a whole, the resist-removed region advances to the position shown by the line 14a, and the developed resist pattern becomes the pattern shown by 14b (C). |