| abstract |
(57) [Problem] To provide a plasma processing apparatus and a processing method capable of suppressing the influence of disturbance. Kind Code: A1 A plasma processing apparatus for processing a sample housed in a vacuum processing chamber, a sensor for monitoring a process amount during the processing, a monitor output from the sensor and a prediction formula for a processing result set in advance. A machining result estimation model 25 for estimating the machining result based on the estimated result of the machining result estimation model, and an optimal recipe calculation model 26 for calculating a correction amount of the processing condition based on the estimation result of the machining result estimation model so that the machining result becomes a target value. And controls the plasma processing apparatus 23 based on the recipe generated by the optimal recipe calculation model. |