| abstract |
(57) An object of the present invention is to provide a chemically amplified positive photoresist composition excellent in various properties such as resolving power, exposure margin, pattern edge roughness, and density dependency. (A) The cation moiety is composed of iodonium or sulfonium, and the anion moiety is R F SO 3 − (wherein R F is a sulfonic acid salt composed of an anion represented by (C 1-20 fluorinated alkyl group), and the difference in carbon number of R F in the anion moiety is 2 A photoacid generator that generates acid upon irradiation with at least two actinic rays or radiation in the range of 15 and (B) a resin containing a specific repeating unit that decomposes by the action of an acid and increases solubility in alkali A positive photoresist composition comprising: |