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publicationDate 2003-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003003266-A
titleOfInvention Atmospheric-pressure plasma processing apparatus, atmospheric-pressure plasma processing method, substrate, optical film, and image display device
abstract (57) [Abstract] [Problem] A film that does not cause aging on a substrate, a dense film, Provided is an atmospheric pressure plasma processing apparatus for forming a film having a strong adhesive force. SOLUTION: Under an atmospheric pressure or a pressure close to the atmospheric pressure, a base material is positioned between electrodes facing each other, and a high-frequency voltage is applied in the presence of a gas containing a reactant gas and an inert gas to discharge plasma. In the atmospheric pressure plasma processing apparatus for performing the surface treatment of the substrate, An atmospheric pressure plasma processing apparatus comprising: a gas inlet for supplying the gas between the opposed electrodes; and changing a reactive gas content of the gas supplied from the gas inlet.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007059305-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4837028-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006129656-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006303265-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008534731-A
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