| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T436-24 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N23-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N23-203 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N31-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N23-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N23-203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N1-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-00 |
| filingDate |
2001-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3aa3ca6eae5de151f111899aebd308f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64cfc5e46eba25df189abf20155903f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43787cc64574ecc1cf273502beb8c07a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f634f9cdb90cb5278742a07bed1e9108 |
| publicationDate |
2002-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2002372525-A |
| titleOfInvention |
Method for measuring impurities in semiconductor wafer and program for measuring impurities in semiconductor wafer |
| abstract |
(57) [Summary] [Problem] It is possible to determine which of the depth direction density distributions obtained by a plurality of methods is true or nearly true. To provide a method for measuring impurities in a semiconductor wafer. SOLUTION: A reference surface concentration is obtained by measuring a surface concentration of an impurity in a semiconductor wafer by a chemical analysis method, a nuclear reaction method or a Rutherford backscattering method, and a depth-direction concentration distribution of the impurity in the semiconductor wafer. A plurality of methods, a step 4 of converting each of the plurality of depth-direction density distributions into surface densities, and selecting a value closest to the reference surface density from the converted surface densities. Determining the density distribution in the depth direction given the surface density as a correct density distribution in the depth direction. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100664868-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007010526-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006191021-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019198651-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I710760-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111989565-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008298770-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111989565-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010112821-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4486557-B2 |
| priorityDate |
2001-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |