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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
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filingDate 2001-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe5ea923691ddf51f74b34b3731ef63b
publicationDate 2002-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002353192-A
titleOfInvention Glass-like carbon chamber inner wall protection member
abstract PROBLEM TO BE SOLVED: To provide a glass-like carbon chamber inner wall protection member which can prevent metal contamination due to erosion of an inner wall by plasma, fulfills a function necessary for stabilizing a process, and can be used for a long time. I will provide a. A glass-like carbon chamber inner wall protection member used in a plasma etching apparatus, wherein the glass-like carbon chamber inner wall protection member has an ash content of 50 ppm or less and a thermal conductivity of 5 W / m ยท K or more.
priorityDate 2001-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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