| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-12 |
| filingDate |
2001-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464180103f87187b3aab20511a8537b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624 |
| publicationDate |
2002-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2002303980-A |
| titleOfInvention |
Positive photoresist composition |
| abstract |
PROBLEM TO BE SOLVED: To provide a positive photoresist composition which can solve the problem of development defects in the production of semiconductor devices and which is also excellent in halftone exposure suitability. SOLUTION: A compound capable of generating an acid upon irradiation with actinic rays or radiation, containing at least (A1) a sulfonium compound of sulfonium and (A2) a sulfonate compound of N-hydroxyimide or a disulfonyldiazomethane compound, a specific lactone structure A resin which contains a repeating unit having the formula: and a resin which is decomposed by the action of an acid and has increased solubility in alkalis. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004068242-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004088429-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7264918-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004077158-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7501220-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100743416-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8198004-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7541138-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7527909-B2 |
| priorityDate |
2001-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |