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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-30
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filingDate 2001-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0bd18a727823049d33f37bf284c4510
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publicationDate 2002-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002299510-A
titleOfInvention Semiconductor device
abstract (57) Abstract: In a semiconductor device manufactured by a photolithography method, a semiconductor device having an insulating resin layer with good patterning accuracy even when exposed to an etching solution or a plating solution before the insulating layer resin is cured. Is to provide. The semiconductor wafer surface comprises at least one phenol novolak (a) having at least one acryloyl group or methacryloyl group, an epoxy resin (b), and a photopolymerization initiator (c), and is photocured. 80 ingredients 20% by weight to 20% by weight, and 20% by weight to 8% of the thermosetting component. An insulating resin layer made of a photosensitive resin composition containing 0% by weight is laminated, a rewiring layer formed by etching a copper foil is located thereon, and an aluminum pad portion on the semiconductor wafer is opened by photolithography. And a wire bonding connection between the rewiring layer and the aluminum pad portion.
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