| abstract |
[Problem] To provide a positive resist composition excellent in resolution and exposure margin which can be suitably used in microphotofabrication using far ultraviolet light, particularly ArF excimer laser light. To do. (A) A resin having a specific aliphatic cyclic hydrocarbon group in a side chain and having a dissolution rate in an alkali developing solution increased by the action of an acid; and (B) a resin formed by irradiation with actinic rays or radiation. A positive resist composition comprising a specific compound generated. |