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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242
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filingDate 2001-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91aa0d909114e0f1b63ac0d7d1eab9fb
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publicationDate 2002-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002267606-A
titleOfInvention Gas detection method
abstract (57) [Summary] [PROBLEMS] To enable safe operation of a device that may generate RuO 4 gas. SOLUTION: A dry etching apparatus 10, a vacuum pump 18, and an abatement apparatus 20 for forming a ruthenium electrode of a capacitor are installed in an airtight chamber of housings 30A, 30B, 30C, and each housing has a main exhaust duct 34. Are connected to the sub exhaust ducts 35A, 35B, 35C branched from Intake intake pipes 36A, 36B, 36C for taking in gas leaked into the hermetic chamber are inserted in each sub exhaust duct, and a gas leak detector 38A for detecting RuO 4 gas in the leaked gas and issuing an alarm is provided in each intake pipe. 38B and 38C are connected. A breakthrough detector 40 that detects RuO 4 gas in the exhaust gas and issues an alarm is connected to an intake pipe 39 connected to the exhaust pipe 23 of the abatement apparatus 20. A tape photoelectric photometric gas sensor is used for the detection unit of the detector. [Effect] Safety measures can be promptly executed by an alarm when RuO 4 gas is detected.
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