Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-268 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 |
filingDate |
2000-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a207c960086af2c955e99cfef4ce14fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12c14d291fd02a8709c0329a8956cdc2 |
publicationDate |
2002-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2002158186-A |
titleOfInvention |
Laser annealing method and apparatus |
abstract |
(57) [Abstract] [Problem] Without reducing the production yield of polysilicon, A laser annealing method capable of minimizing stoppage due to energy shortage is provided. SOLUTION: When there is a pulse having an intensity lower than a predetermined standard value, the energy density is reduced. The grain size of polysilicon formed at the time of laser annealing becomes smaller than a desired size. In multiple consecutive pulses, The irradiation of the excimer laser beam B is stopped when a pulse having an intensity lower than the standard value is measured a predetermined number of times or more. The production yield of polysilicon formed from amorphous silicon 7 by laser annealing is not reduced. Stoppage due to energy shortage such as a missing pulse can be minimized. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008546188-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101424922-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8106341-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100111613-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010245319-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8045184-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/SG-100798-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8339613-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8144341-B2 |
priorityDate |
2000-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |