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filingDate 2000-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14a99f4b7f319f04fdf0457910e87c80
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publicationDate 2002-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002110565-A
titleOfInvention Plasma processing apparatus and processing method, and semiconductor device manufacturing method
abstract (57) Abstract: In a plasma processing apparatus, self-cleaning of an inner wall of a chamber or plasma processing such as precoating can be efficiently performed. SOLUTION: The plasma generation source 2 and the plasma generation source 2 And a plurality of magnetic field generating means 7a and 7b, and magnetic field controlling means 14a14b for independently controlling the magnetic field of each magnetic field generating means 7a and 7b. Have at least the function of reversing the direction of the magnetic field.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012131888-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10458044-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9738992-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8662010-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009529225-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008135393-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012089886-A
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Total number of triples: 28.