| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2001-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78ebd41b7d878a0149ab3fb979a92d41
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dcaf2e41aae10e9b79738c410a8afc8 |
| publicationDate |
2002-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2002091006-A |
| titleOfInvention |
Resist composition containing bulky anhydride additive |
| abstract |
PROBLEM TO BE SOLVED: To provide a resist composition which forms an image with high resolution and excellent etching resistance by imaging with 193 nm radiation and developing the image. SOLUTION: The acid-catalyzed positive resist composition of the present invention comprises (a) an imaging polymer containing a monomer selected from the group consisting of a cyclic olefin, acrylate and methacrylate, and (b) a radiation-sensitive acid generator. , And (c) a bulky anhydride additive. Preferably, the imaging polymer is a cyclic olefin polymer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004004561-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4737386-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006286929-A |
| priorityDate |
2000-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |