http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002079276-A

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filingDate 2000-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2002-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002079276-A
titleOfInvention Wastewater treatment method and apparatus
abstract (57) [Summary] (Problem corrected) [PROBLEMS] In the treatment of wastewater having an oxidation treatment process for contained substances, it is possible to operate the oxidation treatment process under optimal conditions by accurately detecting the end point, thereby enabling excess ozone. Disclosed is a method and an apparatus for treating wastewater from a semiconductor manufacturing process or the like, which can prevent addition or excessive ultraviolet irradiation. SOLUTION: When oxidizing a substance contained in wastewater while circulating the wastewater as water to be treated, the conductivity of the treated water from the oxidation treatment step is measured, and the source of the wastewater containing the substance to be treated is measured. At the stage of the undiluted solution, a trace component of the substance to be treated having conductivity is added at a certain ratio, and when treating the wastewater after using the undiluted solution, the conductivity of the wastewater is measured to measure the conductivity of the wastewater. The concentration of the target substance in the wastewater is detected by measuring the concentration of the trace component, and based on the concentration of the target substance, the conditions for the oxidation treatment of the target substance contained in the wastewater are determined before the treatment. A wastewater treatment method characterized by determining.
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