| abstract |
(A) An alkali-insoluble or poorly soluble polymer compound having an acidic functional group protected by an acid labile group, wherein the acid labile group is eliminated. An alkali-soluble polymer compound, (B) an acid generator, (C) 1,2- A resist material comprising a compound having a naphthoquinonediazidosulfonyl group in a molecule and using ultraviolet light having a wavelength of 300 nm or more as an exposure light source. According to the resist material of the present invention, particularly, 300 Exposure to ultraviolet light of nm or more can form a pattern with high resolution, high sensitivity, and excellent plating resistance. |