http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001522072-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B26-0858 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B26-08 |
| filingDate | 1998-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2001-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001522072-A |
| titleOfInvention | Manufacturing method of thin film type optical path adjusting device |
| abstract | (57) [Summary] A method for manufacturing a thin-film optical path adjusting device is disclosed. The method includes forming a first sacrificial layer using amorphous silicon or polysilicon, forming a second sacrificial layer using the same material as the first sacrificial layer, or using photoresist, spin-on-glass, or spin-on-glass. After forming a second sacrificial layer having a flat surface using a fluid material such as a polymer, a reflective member is formed on the second sacrificial layer to improve the horizontality of the reflective member and improve light efficiency. Can be improved. In addition, the second sacrificial layer made of a fluid material such as spin-on glass or spin-on polymer is removed using oxygen plasma, and the first sacrificial layer is removed using bromine fluoride or xenon fluoride fluoride. Therefore, damage to the substrate, the actuator and the reflection member can be minimized. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012252205-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9164275-B2 |
| priorityDate | 1997-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.