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filingDate 1998-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2001-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001508599-A
titleOfInvention Wafer support system
abstract (57) Abstract: A wafer support system comprising a segmented susceptor (602) having upper and lower sections and gas passages therein. A plurality of spacers or a single spacer (615) projecting from a recess (604) formed in the upper section (608) of the susceptor, the wafer (648) being disposed in spaced relation to the recess. I support. A sweep gas is introduced into the bottom (618) of the segmented susceptor and travels through the gas flow path and exits through at least one circularly arranged outlet in the recess and below the spaced wafer. The sweep gas moves radially outward between the susceptor and the wafer to prevent contamination of the backside of the wafer. The gas passes through the hollow drive shaft and is delayed by a multi-arm susceptor support below the susceptor. The support arm transfers the sweep gas from the drive shaft into the gas passage of the segmented susceptor. The gas passage is configured to heat the sweep gas before delivering it under the wafer. A short purge channel can be provided to deliver a portion of the sweep gas to the area around the spacer and create a continuous flow of protective purge gas around the spacer. A common lower section can cooperate with a plurality of different upper sections to form a segmented susceptor to support different sized wafers.
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