abstract |
[PROBLEMS] To provide an inexpensive method for producing a relief image by direct exposure of an integrated mask. SOLUTION: (a) A first peelable support (1), Laminating the material comprising the image recording layer (2) and the adhesive layer (3) in the order shown to a support (7), an ultraviolet-sensitive material comprising an ultraviolet-sensitive layer (6); At that time, the adhesive layer (3) is laminated to the ultraviolet-sensitive layer (6), and (b) the image-recording layer (2) is image-wise exposed to form a mask. Flood exposing through a mask, and (d) developing the UV-sensitive material, comprising the step of removing a removable support (1). Is removed prior to step (b), (c) or (d), and steps (a)-(d) are performed in less than two months in a method for producing a relief image in situ. |