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filingDate 2001-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d461eab4cb5499505141162d38c69c3d
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publicationDate 2001-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001356491-A
titleOfInvention On-site manufacturing method of relief image
abstract [PROBLEMS] To provide an inexpensive method for producing a relief image by direct exposure of an integrated mask. SOLUTION: (a) A first peelable support (1), Laminating the material comprising the image recording layer (2) and the adhesive layer (3) in the order shown to a support (7), an ultraviolet-sensitive material comprising an ultraviolet-sensitive layer (6); At that time, the adhesive layer (3) is laminated to the ultraviolet-sensitive layer (6), and (b) the image-recording layer (2) is image-wise exposed to form a mask. Flood exposing through a mask, and (d) developing the UV-sensitive material, comprising the step of removing a removable support (1). Is removed prior to step (b), (c) or (d), and steps (a)-(d) are performed in less than two months in a method for producing a relief image in situ.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013506867-A
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