| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate |
2000-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34913e5840f859efba45b1fdd8b394c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b553fa4c70f699d54ddf526f95cdd69 |
| publicationDate |
2001-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2001351798-A |
| titleOfInvention |
Plasma processing apparatus, film forming apparatus, plasma processing method, film forming method, semiconductor device manufacturing method |
| abstract |
(57) [Problem] To provide a plasma processing apparatus capable of generating plasma having a uniform density distribution. SOLUTION: In a plasma processing apparatus for performing plasma processing by introducing a helicon wave into an object to be processed W disposed in a processing container 14, the inside of vacuum vessels 11a and 11b where a helicon wave is generated is directed in a direction of a magnetic field. A plasma processing apparatus which is divided into a plurality by a wall parallel to 20. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010515262-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101032084-B1 |
| priorityDate |
2000-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |