| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2000-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb2be707f5cc72d29cabf3165f0ac1a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c6c4cfe3d21feca0dfa55da5b136228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_082c641a3fdccb49aa7009e9bb29776f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7789bae4d603b1b51231dbfd0d219fb6 |
| publicationDate |
2001-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2001290265-A |
| titleOfInvention |
Radiation-sensitive resin composition and photolithography using the same |
| abstract |
Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming a thick mask pattern having a low temperature crack resistance capable of withstanding dry etching for forming a hole in a silicon wafer substrate or the like, and a photolithography using the same. To do. A compound (B) represented by the following general formula (1) is used with respect to 100 parts by weight of an alkali-soluble copolymer (A). 38 parts by weight of CH 2 = CR 1 COOCH 2 CH (OH) CH 2 -R 3 -CH 2 - CH (OH) CH 2 -OCOCR 2 = CH 2 (1) (C) in one molecule (meth) acryloyloxy 3 to A radiation-sensitive resin composition comprising 2 to 25 parts by weight of a compound having six and (D) 10 to 50 parts by weight of a radiation polymerization initiator, and photolithography for cooling to -20 ° C or lower and dry etching. . |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005202066-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113412289-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020162464-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009531727-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007066661-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109445249-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8927182-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11520231-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022030053-A1 |
| priorityDate |
2000-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |