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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
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filingDate 2000-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_714d62ce42690127f6a3d4eb7388a833
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publicationDate 2001-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001257196-A
titleOfInvention Ceramic substrate for semiconductor manufacturing and inspection equipment
abstract (57) [Problem] To provide a ceramic substrate for a semiconductor manufacturing / inspection apparatus which is hardly deteriorated by oxidation even when used at a high temperature of 200 ° C. or more, and has no drop of a conductive wire and a fluctuation of a resistance value. thing. SOLUTION: In a ceramic substrate for a semiconductor manufacturing / inspection apparatus in which a conductor composed of one or more circuits is formed on or in a surface of a ceramic substrate, a conductive wire is electrically connected to the conductor, A ceramic substrate for a semiconductor manufacturing / inspection apparatus, wherein at least a part of a connection part and a conductive line are coated with a non-oxidizing metal.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014186872-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020110954-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009188389-A
priorityDate 2000-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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