| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1999-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_108d1bb75db5370aede685b3152590f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1b92d60a16c64e9ba09097877f81e04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66847e19f8489e8d6bde6b8413074169
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c26f78710acf84023fb4c2016b1f027 |
| publicationDate |
2001-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2001183832-A |
| titleOfInvention |
Negative radiation-sensitive resin composition |
| abstract |
PROBLEM TO BE SOLVED: To provide a resist pattern having a high resolution and a rectangular cross section in a normal line-and-space pattern to which a normal concentration alkaline developer can be applied, and a sensitivity, Provided is a negative-type radiation-sensitive resin composition having excellent developability and dimensional fidelity. (A) A hydroxystyrene / styrene copolymer having a hydroxystyrene unit content of 65 to 90 mol% and a hydroxystyrene / α-methylstyrene having a hydroxystyrene unit content of 65 to 90 mol%. An alkali-soluble resin containing at least one copolymer selected from copolymers, (B) a radiation-sensitive acid generator containing a hydroxyl group-containing onium salt compound, and (C) N- (alkoxymethyl) glycol A negative radiation-sensitive resin composition comprising a crosslinking agent containing a uryl compound. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007065488-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014097969-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2415790-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004102275-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017105803-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4640051-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016106073-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2415790-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018062503-A |
| priorityDate |
1999-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |