| abstract |
(57) [Summary] [PROBLEMS] To solve the problem of performance improvement technology in fine processing of a semiconductor element using an electron beam or X-ray, An object of the present invention is to develop a negative type chemically amplified resist composition for electron beams or X-rays, which satisfies the sensitivity, resolution and resist shape characteristics for use of electron beams or X-rays. A chemically amplified negative resist composition for electron beam and / or X-ray, comprising an alkali-soluble resin containing a unit having a specific structure, a radiation-sensitive acid generator, and a crosslinking agent capable of crosslinking by an acid. |