| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_306e8347e864c8debf76e4e3e0c3b689 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-507 |
| filingDate |
2000-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e3f47c220d5f63520f28f879ac214ab |
| publicationDate |
2001-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2001127049-A |
| titleOfInvention |
Plasma vacuum substrate processing method and system |
| abstract |
PROBLEM TO BE SOLVED: To provide a plasma vacuum substrate processing method and system capable of rapidly changing the flow of an active gas in a vacuum enclosure. In a method for processing a substrate (16) disposed in a vacuum enclosure (1), the present invention comprises injecting a supplemental flow of control gas into an area (25) near a controlled gas suction means (3). This provides compensation for fluctuations in the active gas supply flow rate through the active gas supply pipe 4. This avoids the pressure control system and the impedance matching system from becoming unable to respond to fluctuations in the input active gas flow in as little as one second. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004296474-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008118017-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006503425-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7855150-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8815106-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016025290-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120024420-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012039048-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101882718-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106504982-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006523030-A |
| priorityDate |
1999-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |