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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G5-082
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filingDate 1999-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87d2143c0ec81fd7bf3714aa78a28386
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8298680bf7fc3f0063af2f45131c3b5
publicationDate 2001-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001115265-A
titleOfInvention High frequency plasma CVD method and high frequency plasma CVD apparatus
abstract (57) [Problem] To efficiently and stably form a high-quality deposited film having an extremely uniform film thickness and a uniform film quality on a large-sized substrate having an arbitrary shape at a high speed. To provide a high-frequency plasma CVD method and a high-frequency plasma CVD apparatus that can be used. A high-frequency plasma CVD method for decomposing a source gas introduced into a reaction vessel to form a deposited film on the substrate to be film-formed, wherein the plasma generating high-frequency electrode has three or more high-frequency electrodes When adjusting the phase of the reflected power at the tip portions on the opposite side of the feed points of these high-frequency electrodes, the positions of the antinodes of the standing waves of each of the three or more high-frequency electrodes are positioned at high frequencies. 1 of power wavelength λ In the range of / 6λ ± 1 / 16λ, the deposited film is formed so as to be continuously shifted from one high-frequency electrode to the next high-frequency electrode successively.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015084317-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10312054-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005211865-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011233844-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007323864-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102149247-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009123513-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015125493-A1
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priorityDate 1999-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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