| abstract |
PROBLEM TO BE SOLVED: To provide a quartz glass capable of generating a crystal phase of quartz glass uniformly on the inner surface of a quartz glass crucible in a short time and keeping pulling a dislocation-free single crystal for a long time. The purpose is to provide a crucible. SOLUTION: At least on the inner surface of the quartz glass crucible which comes into contact with the silicon melt, the surface of the quartz glass base material has an arithmetic average roughness of 0.02 μm to 20 μm, and the surface of the base material has a melting point of silicon. A quartz glass crucible for pulling a silicon single crystal, comprising a coating layer of a substance having a higher melting point than that of the silicon single crystal having a thickness of 0.01 μm to 50 μm. |