http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001085402-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 1999-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b548b181fb29d891e8d4c35062bdce52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9f5497ea600dbc261fe778c17ac999d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be535171b69cd5525aee6d44a9785bcf
publicationDate 2001-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001085402-A
titleOfInvention Vacuum processing apparatus and cleaning method thereof
abstract [PROBLEMS] By continuously processing a semiconductor substrate, of reaction products deposited in a processing chamber, reaction products deposited on the side and lower portions of an electrode which cannot be removed by ordinary cleaning can be efficiently removed. A method and apparatus configuration for performing the method are provided. An electrode height at the time of cleaning is higher than a plasma position, and plasma cleaning is performed. Thus, it is possible to provide a semiconductor manufacturing apparatus cleaning method and apparatus capable of stably processing a semiconductor substrate without generation of foreign matter in continuous processing.
priorityDate 1999-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527022
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17358
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25135
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24553
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415712843
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523397

Total number of triples: 26.