http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001085402-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate | 1999-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b548b181fb29d891e8d4c35062bdce52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9f5497ea600dbc261fe778c17ac999d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be535171b69cd5525aee6d44a9785bcf |
publicationDate | 2001-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2001085402-A |
titleOfInvention | Vacuum processing apparatus and cleaning method thereof |
abstract | [PROBLEMS] By continuously processing a semiconductor substrate, of reaction products deposited in a processing chamber, reaction products deposited on the side and lower portions of an electrode which cannot be removed by ordinary cleaning can be efficiently removed. A method and apparatus configuration for performing the method are provided. An electrode height at the time of cleaning is higher than a plasma position, and plasma cleaning is performed. Thus, it is possible to provide a semiconductor manufacturing apparatus cleaning method and apparatus capable of stably processing a semiconductor substrate without generation of foreign matter in continuous processing. |
priorityDate | 1999-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.