| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_526cb931f1382d6e016ee651d55e1365 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F265-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F265-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D163-10 |
| filingDate |
2000-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee40ce68d3315e15ea938c010246647b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60f3e37e1e64aefd4e02721005c010c6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf90fc148d51b000194789d366cd969d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05f4e0d8ac0746b16fa2202074eeff84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ae7fc43d514eb7fd1b3220168fb2d34 |
| publicationDate |
2001-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2001083696-A |
| titleOfInvention |
Antireflection polymer and method for producing the same, antireflection film composition, pattern formation method, and semiconductor element |
| abstract |
PROBLEM TO BE SOLVED: To provide an anti-reflection polymer capable of preventing reflection at a lower film layer on a wafer in an ultra-fine pattern forming process mainly using an ArF (193 nm) light source in a semiconductor manufacturing process. It is intended to provide. SOLUTION: The antireflection polymer is represented by the following formula (1) and is used as an antireflection film when forming an ultrafine pattern of a semiconductor device. Embedded image |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015091954-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7163221-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017107185-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2006077748-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4753046-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002193893-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115725216-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020147633-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006077748-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10509320-B2 |
| priorityDate |
1999-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |