http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001044181-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_06f6859e19dacec5a834168e491504b2 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 |
| filingDate | 1999-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0275e402e5897a3925fb1365d7e06ce http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c314d53ab121795b0a2360270949bf1f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57a7b26ee4224a23a4c1209631c31106 |
| publicationDate | 2001-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001044181-A |
| titleOfInvention | Semiconductor wafer plasma processing method and apparatus |
| abstract | (57) [Problem] To prevent a sulfur content in a processing gas from flowing out of a plasma processing apparatus. An etching apparatus includes, in a chamber, a loader-side cassette chamber, an etching chamber, a cleaning chamber, and an unloader-side cassette chamber in this order. The etching chamber 15 is provided with plasma etching means 14, and the cleaning chamber 17 is provided with a water cleaning unit 16. A silicon wafer W before etching is extracted from the loader-side cassette 12 and transferred to the etching stage S. At the stage, the surface of the silicon wafer W is etched by the PACE method. At this time, the etching gas SF 6 , In SF 4 , sulfur molecules are also dissociated and adhere to the silicon wafer W. The silicon wafer W is washed with pure water in a washing unit, and sulfur content is completely removed. As a result, the sulfur content attached to the wafer W does not move to the cassette 18. Therefore, the sulfur content does not flow out of the apparatus. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101314162-B1 |
| priorityDate | 1999-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.