http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001005186-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1999-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23c43aa3fe55d690d955960d87a560cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11afba3cb21b2f665bb1b91dad62e33d |
publicationDate | 2001-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2001005186-A |
titleOfInvention | Fine pattern forming method and photosensitive substrate used therefor |
abstract | (57) [Summary] (Problem corrected) [PROBLEMS] To form a fine pattern using a photosensitive substrate provided with a photoresist layer via an organic anti-reflection layer on a substrate, and to reflect the in-plane reflectance of the substrate. Provided is a photosensitive substrate adjusted so as to obtain a product with a constant quality even if the variation occurs. SOLUTION: An organic solvent solution containing a high light-absorbing compound and a nitrogen-containing crosslinking compound is applied on a substrate, dried to form an organic anti-reflection layer, a photoresist layer is laminated thereon, and then an image is formed. When a fine pattern is formed by performing formation exposure and development treatment, the refractive index of the organic antireflection layer is adjusted to 1.7 or more by selecting the type and content of the high light absorbing compound in the organic solvent solution. It is adjusted to the range of 2.1 or less and the extinction coefficient to the range of more than 0.6 and 1.0 or less. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012093731-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004102203-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9447303-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9040232-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7947424-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004008253-A1 |
priorityDate | 1999-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 193.