Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-231 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-5346 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-23 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-91 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1884 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3435 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-23 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-91 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate |
1997-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2000-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2000514246-A |
titleOfInvention |
Dry etching method of transparent electrode in low pressure plasma reactor |
abstract |
(57) Abstract: A method for dry etching an indium-tin oxide (ITO) layer deposited on a substrate in a low pressure plasma reactor is disclosed. The method comprises the steps of: placing a substrate having an ITO layer in a low-pressure plasma reactor; introducing an etching source gas into the low-pressure plasma reactor; A step of exciting the plasma and a step of etching the ITO layer with the plasma are included. |
priorityDate |
1996-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |